Review of hydrothermal ZnO nanowires: Toward FET applications
In this short review, the authors put forward the case that ZnO nanowires grown by low temperature (<100 °C) hydrothermal synthesis routes are suitable for use in both single-wire field effect transistor (FET) devices and multiwire FET devices, and are capable of achieving device characteristics that are at least as good as ZnO nanowires produced by high temperature (>600 °C) vapor phase methods. The hydrothermal synthesis route displays many advantages over vapor phase synthesis routes, the foremost being the compatibility of hydrothermal synthesis with flexible and vulnerable substrates. However, most hydrothermally synthesized ZnO nanowires require annealing at temperatures above 400 °C in order to exhibit field dependent transport necessary for FET devices. Effort should be directed toward understanding the mechanism causing some as-grown hydrothermal ZnO nanowires to display field dependence without the need for annealing. If these mechanisms are understood, great strides can be made in achieving integrated nanodevices using lateral arrays on technologically relevant substrates and understanding the fundamental cause of doping leading to n-type behavior in ZnO.
Silver nanoparticles have been obtained by photoreduction from solutions during the last two decades, but the growth of differently structured silver nanoparticles directly onto transparent substrates has not been a major area of research. An analysis of silver deposition on glass substrate ... mehr
The authors present a focused ion beam lithography (IBL) instrument and its extension toward using different ion species beyond gallium. The base instrument utilizes a lithography architecture and an ion source and column dedicated to nanofabrication. This includes large area navigation and ... mehr
Substrate conformal imprint lithography (SCIL) is an innovative soft lithography method for the transfer of large area nanostructures. This technology was originally invented by Philips Research. With the implementation of the SCIL process on mask aligners, the standard alignment options of ... mehr