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SiO2/TiO2 distributed Bragg reflector near 1.5 μm fabricated by e-beam evaporation

The authors report on the fabrication and characterization of SiO2/TiO2 distributed Bragg reflector (DBR) mirrors operating at the eye safe and optical communication wavelength window, λ = 1.5 μm. Our experimental results demonstrated that SiO2/TiO2 DBR mirrors with reflectivity exceeding 95% at λ = 1.5 μm can be achieved using e-beam evaporation in conjunction with postdeposition thermal annealing process in ambient air. It was found that the postdeposition annealing process transformed the crystal structure of the as-deposited TixOy to TiO2, leading to a significant reduction in optical absorption. Erbium doped III-nitride semiconductors incorporating DBR mirrors at 1.5 μm emission may open up many novel applications, including infrared emitters, optical amplifiers, and high power infrared lasers.

Autoren:   I-Wen Feng, Sixuan Jin, Jing Li, Jingyu Lin, and Hongxing Jiang
Journal:   Journal of Vacuum Science & Technology B
Band:   31
Ausgabe:   6
Jahrgang:   2013
Seiten:   061514
DOI:   10.1116/1.4823705
Erscheinungsdatum:   01.10.2013
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